How math can help optimize complex machines @ASML
By Paul Donkers
ASML lithography systems are used to produce microchips with nanometer accuracy. This is only possible because of the large number of the intricate math-based software solutions that are used to optimize the performance of these complex machines. This lecture will give a glimpse into mathematical problems that arise when trying to squeeze every last nanometer out of ASML's lithography systems.
Note: after subscribing, showing up is mandatory! There are 135 spots only with first come first serve, priority will be given to students that sign up with their GEWIS account.
Please contact Corporate Communication and Contact Committee or the board (ceb@gewis.nl) with any questions, concerns or if you are unable to attend after the deadline for unsubscribing has passed. Have fun!
This sign-up list has a limited capacity and is open from Friday, April 17, 2026 at 12:00 PM till Monday, June 1, 2026 at 11:59 PM.